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Structural, optical, and mechanical properties of silicon nitride films deposited by inductively coupled plasma enhanced chemical vapor deposition

LSF
61910
Affiliation
Optoelectronics, University of Duisburg-Essen, Lotharstraße 55, 47057 Duisburg, Germany
Abacıoğlu, Ezgi;
LSF
54487
Affiliation
Optoelectronics, University of Duisburg-Essen, Lotharstraße 55, 47057 Duisburg, Germany
Fernández Estévez, José Luis;
GND
103673627X
ORCID
0000-0003-1036-2120
LSF
2648
Affiliation
Optoelectronics, University of Duisburg-Essen, Lotharstraße 55, 47057 Duisburg, Germany
Stöhr, Andreas
In this study, a low-temperature and low-pressure SiNx film deposition on InP substrates is investigated using inductively coupled plasma enhanced chemical vapor deposition (ICPECVD) technology. We discuss herein the results of an extensive characterization of structural and mechanical properties of the ICPECVD-SiNx films.

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Conference:
Advanced Properties and Processes in Optoelectronic Materials and Systems (APROPOS 18), 5-7 October 2022, Vilnius, Lithuania
Date Issued:
2022
URN:
urn:nbn:de:hbz:465-20230403-102820-7
DOI:
10.17185/duepublico/78077
Language:
English
Type of Resource:
Text
Collection:
E-Publications
Subject categories of the Deutsche Nationalbibliografie:
621.3 Electrical Engineering, Electronics
Hosting institution:
Faculty of Engineering, Engineering and Information Technology, Optoelectronics
version identification:
Version of Record / Verlagsversion
Info on primary publication:

Abacıoğlu, E., Fernández Estévez, J. L., & Stöhr, A. (2022). Structural, optical, and mechanical properties of silicon nitride films deposited by inductively coupled plasma enhanced chemical vapor deposition. In: Advanced Properties and Processes in Optoelectronic Materials and Systems (APROPOS 18): book of abstracts. Center for Physical Sciences and Technology, Vilnius, Lithuania, p. 79. ISBN 978-609-96355-0-7
https://www.ftmc.lt/uploads/APROPOS18/APROPOS18_abstract_book_ISBN%20978-609-96355-0-7.pdf

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